SUBSTRATE PROCESSING APPARATUS

摘要

The present invention comprises: a first tube which has an inner space; a substrate holder for vertically stacking a plurality of substrates in the inner space of the first tube and independently forming a plurality of processing spaces in which each substrate is being processed; a gas supply unit which has a plurality of main injection holes, being vertically disposed in correspondence with each of the processing spaces, so as to supply a gas into the first tube; and a discharge unit which is for discharging out the gas, which has been supplied to the plurality of processing spaces inside the first tube, wherein the discharge unit comprises a plurality of discharge holes facing the main injection holes and disposed vertically in a line and in correspondence with each of the processing spaces, thereby enabling smooth flow of the gas on the substrates.