| 摘要 |
<p>PURPOSE:To reduce the unnecessary light intensity peak and prevent the abnormal transfer of a pattern by arranging a transparent auxiliary pattern having the same phase difference of the transmitted light as that of a transparent region on a projected main pattern. CONSTITUTION:A photo-mask contains at least a translucent region and a transparent region to the exposure light and has the phase difference of about 180 deg. between the light passing through the translucent region and the light passing through the transparent region, and a transparent auxiliary pattern 8 having the same phase difference of the transmitted light as that of the transparent region is arranged on a projected main pattern 7. The second light intensity peak generated around the main pattern 7 constituted of the transparent region is reversed in phase with respect to the main pattern 7, and the unnecessary light intensity peak inside the main pattern 7 constituted of the translucent region is the same in phase as the translucent main pattern. When the auxiliary pattern 8 in the same phase as the transparent region, i.e., practically in the opposite phase to the unnecessary light intensity peak, is arranged on the unnecessary peak portion, the unnecessary light intensity peak is negated.</p> |
