发明名称 |
FORMATION OF SEMICONDUCTOR QUANTUM BOX |
摘要 |
PURPOSE:To prevent damage to the junction boundary between a quantum box and an electron supplying layer deposited thereon, and enhance the accuracy of machining quantum boxes themselves. CONSTITUTION:A semiconductor layer 2 of AlAs and a semiconductor layer 3 of GaAs are formed on each terrace of an inclined substrate 1 of GaAs by lateral growth to form an AQAs/GaAs superlattice structure. A semiconductor layer 5 of n-AlGaAs to be an electron supplying layer is grown to cover the entire surface of these semiconductor layers 2 and 3. The semiconductor layer 5 is then patterned, and the semiconductor layer 3 is selectively etched using the patterned semiconductor layer 5 as a mask to form a quantum box. |
申请公布号 |
JPH06302514(A) |
申请公布日期 |
1994.10.28 |
申请号 |
JP19930116489 |
申请日期 |
1993.04.19 |
申请人 |
SANYO ELECTRIC CO LTD |
发明人 |
NAKANO HARUO;HARADA YASOO |
分类号 |
H01L21/20;H01L29/06;H01L29/205;H01L29/68;H01L29/80;(IPC1-7):H01L21/20;H01L29/804 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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