发明名称 FORMATION OF SEMICONDUCTOR QUANTUM BOX
摘要 PURPOSE:To prevent damage to the junction boundary between a quantum box and an electron supplying layer deposited thereon, and enhance the accuracy of machining quantum boxes themselves. CONSTITUTION:A semiconductor layer 2 of AlAs and a semiconductor layer 3 of GaAs are formed on each terrace of an inclined substrate 1 of GaAs by lateral growth to form an AQAs/GaAs superlattice structure. A semiconductor layer 5 of n-AlGaAs to be an electron supplying layer is grown to cover the entire surface of these semiconductor layers 2 and 3. The semiconductor layer 5 is then patterned, and the semiconductor layer 3 is selectively etched using the patterned semiconductor layer 5 as a mask to form a quantum box.
申请公布号 JPH06302514(A) 申请公布日期 1994.10.28
申请号 JP19930116489 申请日期 1993.04.19
申请人 SANYO ELECTRIC CO LTD 发明人 NAKANO HARUO;HARADA YASOO
分类号 H01L21/20;H01L29/06;H01L29/205;H01L29/68;H01L29/80;(IPC1-7):H01L21/20;H01L29/804 主分类号 H01L21/20
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