PATTERN DEFECT DETECTION METHOD

摘要

PURPOSE:To provide a method for detecting pattern defect which can detect the presence or absence of a failure accurately even if reflection light/scattered light intensity is large and there are different kinds of faulty defects. CONSTITUTION:The title method is used to obtain the difference between image data A of a reference pattern and image data B of a pattern to be inspected. The title method for detecting a defect in an inspection pattern by judging whether the difference is within an allowable range is provided with a process (ST15) for obtaining difference data C which is obtained by subtracting the image data A from the image data B and then emphasizing the image, a process (ST16) for obtaining difference data D which is obtained by subtracting the image data B from the image data A and then emphasizing the image, and a process (ST17) for judging the presence or absence of a fault by comparing the larger one of the difference data C and the difference data D with a specific slice level.