CLEANING SOLUTION FOR APPARATUSES USED FOR PRODUCTION OF PHOTOSENSITIZER, APPARATUSES USED FOR PREPARATION OF POSITIVE RESIST SOLUTIONS AND SPIN COATER LINE PIPINGS, AND CLEANING METHOD USING THE CLEANING SOLUTION

摘要

The present invention provides a cleaning solution excellent in cleaning efficiency which is used for cleaning apparatuses for producing photosensitive agents, apparatuses for preparing positive type resist solutions or spin coater line pipings. The invention further provides a practically useful cleaning method. The cleaning solution is characterized by containing N-methylpyrrolidone and the cleaning method is carried out using the cleaning solution.