发明名称 QUANTITATIVE ANALYSIS OF POLYMER SURFACE BY X-RAY PHOTOELECTRON SPECTROSCOPY
摘要 PURPOSE:To allow simple and highly accurate quantitative analysis of polymer surface through the use of a relative sensitivity coefficient determined from a polymer of same elemental system as a sample. CONSTITUTION:The clean surface of a polymer having known elemental composition or unit chemical structure of same elemental composition as a sample is measured to determine the peak value along with the atomic concentration (except hydrogen) of the compositional elements thus determining a relative sensitivity coefficient. Since the polymer is scarcely deteriorated in the atmosphere and provides a clean surface easily when subjected to ultrasonic cleaning with an organic solvent, the relative sensitivity coefficient can be determined accurately. Furthermore, measurement can be simplified because the relative sensitivity coefficients can be determined for a plurality of elements from one sample. The surface composition of polymer can be determined easily with high accuracy because the matrix effect, caused by the composition, density, crystallinity, etc., of matrix, can be corrected.
申请公布号 JPH0735711(A) 申请公布日期 1995.02.07
申请号 JP19930200135 申请日期 1993.07.21
申请人 SUMITOMO METAL MINING CO LTD 发明人 OTSUKA YOSHIHIRO
分类号 G01N23/227 主分类号 G01N23/227
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