| 摘要 |
PURPOSE:To provide a method for manufacturing a color filter with small surface unevenness by providing a black photosensitive resin layer on the whole surface of a transparent base, covering a picture element pattern, and after exposure from the black photosensitive resin layer side through photomasks, applying developing treatment again. CONSTITUTION:Colored picture elements 2-4 of red, green, blue colors, and the like corresponding to the purpose are formed on a transparent base 1. A black photosensitive resin layer 5 is then provided on the picture element pattern, and exposure is performed from the resin face side through masks 8. After development, ultraviolet rays are radiated from the opposite face side to harden the black photo-sensitive resin near the base 1, and then develop it again for an appropriate time. Although the developing time is slightly longer by back face exposure, no gap is formed between the black photosensitive resin layer 5 and the picture elements 2 to 4, and protrusions 9 become smaller so as to be able to form a color filter requiring neither a polishing process nor a smoothing layer. The redeveloping time is changed according to the concentration of a developer and the temperature, but it is desirable to be within 60 seconds taking account of productivity. |
