SYSTEM FOR GENERATING EXTREME ULTRA VIOLET LIGHT

摘要

A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.

主权项

1. An extreme ultraviolet (EUV) light generation system configured to irradiate a target material with a laser beam to generate EUV light and to output the EUV light to an exposure apparatus, the EUV light generation system comprising:
a laser apparatus configured to output the laser beam to irradiate the target material; a focusing optical system configured to focus the laser beam outputted from the laser apparatus; a target generator configured to output the target material; an EUV light monitor configured to detect a generation position at which the EUV light is generated; and a controller configured to control generation of the EUV light, wherein: when the controller receives an EUV light generation position specification signal specifying a predetermined position as the generation position, the controller adjusts the focusing optical system such that a focus position of the laser beam coincides with the predetermined position and adjusts a position of the target generator to allow the target material to pass through the predetermined position; and upon receiving the generation position detected by the EUV light monitor, the controller determines whether or not the received generation position falls within a permissible range, and, when the received generation position does not fall within the permissible range, the controller adjusts at least one of the position of the target generator and the focusing optical system such that the received generation position falls within the permissible range.