摘要 |
A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid diester of at least one member selected from the phenol compounds represented by the following general formulas: <CHEM> wherein R1 and R2 each represent hydrogen, halogen, -OCOR3 , alkyl or alkoxy in which R3 represents alkyl or phenyl, x and y each represent 1, 2 or 3, and R, Ro, R' and Ro' each represent hydrogen atom, alkyl or phenyl group; wherein the content of said diester is 50% or greater based on the total light-sensitive quinonediazide material. This composition is excellent in the balance between properties such as resolution, profile and depth of focus. |