发明名称 K CELL TYPE VAPOR SOURCE HAVING AN IMPROVED SHUTTER
摘要 This invention relates to a K cell type vapor source used for film deposition by a MBE method and a reactive co-evaporation. The K cell comprises a crucible, a small orifice above the crucible through which the crucible emits a molecular beam, and a shutter which substantially opens and closes the small orifice so as to control the molecular beam. According to the present invention, the crucible radiates sufficient heat so as to prevent overheating when the shutter is closed so that the crucible emits a stable molecular beam immediately after the shutter is opened.
申请公布号 CA2153754(A1) 申请公布日期 1996.01.13
申请号 CA19952153754 申请日期 1995.07.12
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 NAKAMURA, TAKAO;IIYAMA, MICHITOMO
分类号 C30B25/16;C23C14/24;C30B23/06;H01L21/203;(IPC1-7):C30B35/00 主分类号 C30B25/16
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