| 摘要 |
<p>A photosensitizer comprising a diazo ester of structure (I) wherein: X = Cl, Br, I, OH, OR, COOR, COOAr(OH)n, COAr(OH)n, COR, R, Ar(OH)n; R = C1-C8 alkyl, n = 0 to 5, Ar = phenyl, as the backbone, where at least one of the hydroxy groups on phenyl ring has been esterified with diazo-sulfonyl chloride comprising 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride, or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.</p> |
