| 摘要 |
A semiconductor substrate is formed by bonding wafers together by heat-treatment without causing the substrate to be thermally damaged to have thermal strain, separation, cracks, etc. due to a difference in the thermal expansion coefficients of the wafers. Particularly, a semiconductor substrate having an SOI structure with a silicon film thin enough to allow various integrated circuits or TFL-LCD to be formed, is produced. After wafers are bonded temporarily in a low temperature range, one of the wafers is made thin by chemical treatment, then the wafers are bonded fully by heat-treatment in a temperature range (where the thermal expansion coefficients of the wafer are not affected) higher than the above low temperature range, and then said one wafer can be made thinner by mechanical grinding or polishing mechano-chemically. Even if a semiconductor substrate is formed by sticking a silicon wafer and a quartz wafer together, damages that will be caused thermally due to thermal expansion can be prevented, and a film can be easily obtained which is sufficiently thin as required for forming various integrated circuits or TFT-LCD or the like. <IMAGE> |
