| 发明名称 |
GUARD RING STRUCTURE AND METHOD FOR FORMING THE SAME |
| 摘要 |
A guard ring structure having a semiconductor substrate with a circuit region encircled by a first ring and a second ring. At least one of the first and second ring includes: a plurality of separated doping regions formed in various top portions of the semiconductor substrate, providing P-N junction or N-P junction on bottom of the plurality of separated doping regions; and an interconnect element formed over the semiconductor substrate, covering at least portion of the plurality of separated doping regions. |
| 申请公布号 |
US2016300801(A1) |
申请公布日期 |
2016.10.13 |
| 申请号 |
US201615186937 |
申请日期 |
2016.06.20 |
| 申请人 |
MediaTek Singapore Pte. Ltd. |
发明人 |
LU Chiyuan;LIN Chien-Chih;HUNG Cheng-Chou;HUANG Yu-Hua |
| 分类号 |
H01L23/00;H01L21/761;H01L29/06 |
主分类号 |
H01L23/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A guard ring structure, comprising
a semiconductor substrate with a circuit region encircled by a first ring and a second ring, and at least one of the first and second ring comprises:
a plurality of separated doping regions formed in various top portions of the semiconductor substrate, providing P-N junction or N-P junction on bottom of the plurality of separated doping regions; andan interconnect element formed over the semiconductor substrate, covering at least portion of the plurality of separated doping regions. |
| 地址 |
Singapore SG |
