发明名称 MANUFACTURING APPARATUS OF THIN FILM PHOTOELECTRIC CONVERSION ELEMENT
摘要 PURPOSE: To control independently an applied voltage and uniformalize a film thickness distribution and film quality of a thin film formed on one face of a substrate by a method wherein a first electrode each end face of which airtightly comes into contact with the substrate to form a film formation space and a second electrode facing to each other across the substrate are provided with respect to flexible substrates of two columns carried in parallel. CONSTITUTION: A high voltage electrode 21 is provided between flexible substrates 1 of two columns carried in parallel and grounding electrodes 22 are respectively arranged on the outside of each of the substrates 1 facing the high voltage electrode 21. The high voltage electrodes 21 are coupled to each other via a discharge block 9 composed of an insulator on the back face part, and further the end face is closely adhered to the substrate 1 via a seal block 8 to form a film formation chamber 5 capable of holding an airtightness. Thus, thin films of excellent quality can be formed on the flexible substrates 1, and it is possible to prevent a manufacturing apparatus of a thin film photoelectric conversion element from becoming larger in scale.
申请公布号 JPH08293491(A) 申请公布日期 1996.11.05
申请号 JP19950099054 申请日期 1995.04.25
申请人 FUJI ELECTRIC CORP RES & DEV LTD 发明人 SHIMIZU HITOSHI
分类号 H01L21/31;H01L31/04 主分类号 H01L21/31
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