| 摘要 |
PURPOSE:To obtain a light receiving member having various characteristics independently of environment, e.g., superior optical fatigue resistance, durability, moisture resistance, no residual potential, high sensitivity, a high S-N ratio and high dielectric strength by forming a photosensitive layer contg. a-Si as the principal component and a surface layer contg. Si and a prescribed atom on a support having a prescribed surface shape. CONSTITUTION:A support 101 has unevenness finer than resolving power required by a light receiving member and the unevenness has a cross-sectional shape formed by the superposition of secondary peaks on primary peaks. The unevenness is formed by chemical etching, electroplating, vapor deposition, sputtering, lathing or other method. It is preferable that the projections of the unevenness are arranged regularly or periodically. A photosensitive layer 102 contg. a-Si (H, X) as the principal component is formed on the support 101 and a surface layer 103 contg. at least one among O, C and N besides a-Si as the principal component is formed on the layer 102. An optical band gap on the interface between the layers 102, 103 is adjusted. |
