ALIGNMENT METHOD OF SEMICONDUCTOR WAFER

摘要

A method for arranging a pattern of a semiconductor wafer capable of preventing a wrong arrangement of a wafer due to the generation of a standing wave is disclosed. In the method, first and second arranging lights are sequentially incident on an upper surface of a wafer(1) on which an arranging mark(2) and intensities of reflected light of the first and second arranging lights are each detected. The distribution of the detected intensities of the reflected lights are compared with each other. A point of the wafer which has bigger constant intensitydistribution is selected so that the wafer is arranged based on an arranging coordinate of the selected point of the wafer.