PARTICLE REDUCTION APPARATUS IN SEMICONDUCTOR SPUTTER,申请号KR19930029339U-传众专利搜索

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发明名称	PARTICLE REDUCTION APPARATUS IN SEMICONDUCTOR SPUTTER
摘要
申请公布号	KR970003176(Y1)	申请公布日期	1997.04.14
申请号	KR19930029339U	申请日期	1993.12.23
申请人	LG SEMICONDUCTOR CO.,LTD.	发明人	KIM, YOUNG-DO;KANG, SHIN-TAEK
分类号	H01L21/203;(IPC1-7):H01L21/203	主分类号	H01L21/203
代理机构		代理人
主权项
地址

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