| 摘要 |
A (200) face texture with high density by using a chilled high silicon strip is formed by heat treatment of the quenched high Si strip at 1085 to 1125 deg. C in a vacuum of up to 10-4 torr or in a nitrogen atmosphere containing 5 to 20% of hydrogen for at least 1 to 4 hours. Said strip consists, by weight, of 5.3 to 5.7% of Si, 0.8 to 1.2% of Mn, 6.3 to 6.7% of Si+Mn, and the balance being Fe and inevitable impurities.
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