发明名称 UNIBODY GAS PLASMA SOURCE TECHNOLOGY
摘要 <p>A unibody, monolithic, one-piece PBN plasma chamber for an MBE gas plasma source. The chamber has a cylindrical configuration with at least one effusion orifice and a gas inlet opening. The gas inlet opening is preferably communicatively connected to an elongated, tubular inlet member. The inlet member is preferably coupled to a liquid cooled gas source by an intermediary connection member which is preferably constructed of a refractory metal. The chamber minimizes leakage and maximizes efficiency. A gas plasma source assembly and a method for making the chamber are also disclosed.</p>
申请公布号 WO1997016246(A1) 申请公布日期 1997.05.09
申请号 US1996017315 申请日期 1996.10.30
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