JIDOICHIZUREKANRISOCHI

摘要

PURPOSE:To calculate the shift of a position with high accuracy by converting a mark for measuring position shift that is formed on a wafer into a luminance signal by using a microscope and a photoelectric conversion means and demarcating the boundary of the mark for measuring position shift after inputting the luminance signal in a position shift operating means and then, calculating the shift of the position. CONSTITUTION:Marks 21 and 23 for measuring position shift that are formed on a wafer 2 are magnified by using a microscope 4 and these marks are converted into luminance signals by using a photoelectric conversion means 5. The luminance signals are inputted in a position shift operating means 6 and the boundary of the marks for measuring position shift is demarcated by using the method of least squares and a slice method or the like. The shift of positions is thus calculated.