| 发明名称 |
PROCESS THAT ENABLES THE CREATION OF NANOMETRIC STRUCTURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS |
| 摘要 |
The invention relates to a process that enables the creation of nanometric structures by self-assembly of block copolymers, at least one of the blocks of which is crystallizable or has at least one liquid crystal phase. |
| 申请公布号 |
US2016333221(A1) |
申请公布日期 |
2016.11.17 |
| 申请号 |
US201415103740 |
申请日期 |
2014.12.11 |
| 申请人 |
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) ;UNIVERSITE DE BORDEAUX ;INSTITUT POLYTECHNIQUE DE BORDEAUX ;ARKEMA FRANCE |
发明人 |
MUMTAZ Muhammad;AISSOU Karim;BROCHON Cyril;CLOUTET Eric;FLEURY Guillaume;HADZIIOANNOU Georges;NAVARRO Christophe;NICOLET Celia;CHEVALIER Xavier |
| 分类号 |
C09D183/00;G03F7/00;B81C1/00;C08G77/00 |
主分类号 |
C09D183/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A nanostructured assembly process using a composition comprising a block copolymer, at least one of the blocks of which is crystallizable or has at least one liquid crystal phase, wherein the process comprises the following steps:
dissolving the block copolymer in a solvent to form a solution, depositing the solution on a surface, annealing. |
| 地址 |
Paris Cedex 14 FR |
