发明名称 PATTERN EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To form stripe patterns of shapes divided into discrete parts with high efficiency by using an endless belt of a shape formed with the inside of pattern parts remaining only the external shape parts of the stripe patterns to be formed as apertures. SOLUTION: The light shieldable endless belt 9 formed with the pattern parts remaining only the external shape parts of the stripe patterns to be formed as apertures is installed right above a mask 8 for exposure. This belt is moved in strict synchronization with the transporting speed, direction and parallelism of a base material 1. The base material 1 under transportation is irradiated with the irradiation light from a light source 10 in the state of strictly synchronizing such endless belt 9 and the base material 1. The irradiation light from the parts where both of the striped patterns of the mask 8 for exposure and the external shapes of the patterns of the endless belt 9 arrives at the base material surface. As a result, the striped patterns divided into discrete parts are formed brightly with high accuracy without the occurrence of unsharpness at the boundaries.
申请公布号 JPH1010745(A) 申请公布日期 1998.01.16
申请号 JP19960157988 申请日期 1996.06.19
申请人 TOPPAN PRINTING CO LTD 发明人 MIHASHI NOBORU;KUMAMOTO YUICHI;SUGIURA TAKEO;FUKUDA YOICHIRO
分类号 G02B5/20;G02F1/1335;G03F7/20 主分类号 G02B5/20
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