| 摘要 |
PROBLEM TO BE SOLVED: To impart a superior chemical and heat resistances to a formed heat- cured pattern and to ensure a superior resolution in forming a pattern by incorporating a specified novolak resin as a base polymer acting also as a sensitizer and a specified melamine compd. as a heat curing agent. SOLUTION: This heat curable photosensitive material contains a resin having repeating units represented by formula I and a wt. average mol wt. of 1,000-30,000, a melamine compd. represented by formula II and a solvent dissolving them. The amt. of the melamine compd. is 5-30 pts.wt. per 100 pts.wt. of the resin. In the formula I, a residue of 1,2-naphthoquinonediazido-4-sulfonic ester and/or a residue of 1,2-naphthoquinonediazido-5-sulfornic ester has been substd. for 3-27mol% of the H atoms of phenolic hydroxyl groups on average and (m) is an integer of 0-3. In the formula II, each of X1 -X6 is H or -CH2 OY and Y is H or 1-6C straight chain or branched alkyl. |
