| 摘要 |
PROBLEM TO BE SOLVED: To provide a baking apparatus of easy maintenance, which facilitates transferring wafers to a hot plate, by employing a mechanism for drawing a lower hot plate out to expose it to an upper hot plate. SOLUTION: A lower hot plate 18 is guided by a slide rail 1 when it is drawn out together with temperature controllers 9 and 10 so that it can be exposed to an upper hot plate 77 placed on the uppermost stage in a housing. An electromagnetic lock 2 is provided for holding the rear end of the lower hot plate 18. A thermometer 5 is moved horizontally above the lower hot plate by a swivel arm 7 and vertically by a feed mechanism 6 so that it can make contact with the surface of the lower hot plate 18. |
