发明名称 |
GaSbGe PHASE CHANGE MEMORY MATERIALS |
摘要 |
A Ga—Sb—Ge family of phase change memory materials is described, including GaxSbyGez, wherein a Ga atomic concentration x is within a range from 20% to 45%, a Sb atomic concentration y is within a range from 25% to 40% and a Ge atomic concentration z is within a range from 25% to 55%, is described wherein the material has a crystallization transition temperature Tx greater than 360° C. Adding impurities including one or more element selected from silicon Si, carbon C, oxygen O and nitrogen N, can also increase the crystallization transition temperature Tx to temperatures greater than 400° C., and also reduce reset current. |
申请公布号 |
US2016372661(A1) |
申请公布日期 |
2016.12.22 |
申请号 |
US201514936318 |
申请日期 |
2015.11.09 |
申请人 |
MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
CHENG HUAI-YU;LUNG HSIANG-LAN |
分类号 |
H01L45/00;C22C28/00;C22C12/00;C22C30/00;H01B1/02;H01L27/24 |
主分类号 |
H01L45/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. A phase change material, comprising GaxSbyGez, wherein x, y and z are atomic percentages, with a Ga atomic concentration x within a range from 20% to 45%, a Sb atomic concentration y within a range from 25% to 40% and a Ge atomic concentration z within a range from 25% to 55%. |
地址 |
HSINCHU TW |