发明名称 GaSbGe PHASE CHANGE MEMORY MATERIALS
摘要 A Ga—Sb—Ge family of phase change memory materials is described, including GaxSbyGez, wherein a Ga atomic concentration x is within a range from 20% to 45%, a Sb atomic concentration y is within a range from 25% to 40% and a Ge atomic concentration z is within a range from 25% to 55%, is described wherein the material has a crystallization transition temperature Tx greater than 360° C. Adding impurities including one or more element selected from silicon Si, carbon C, oxygen O and nitrogen N, can also increase the crystallization transition temperature Tx to temperatures greater than 400° C., and also reduce reset current.
申请公布号 US2016372661(A1) 申请公布日期 2016.12.22
申请号 US201514936318 申请日期 2015.11.09
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 CHENG HUAI-YU;LUNG HSIANG-LAN
分类号 H01L45/00;C22C28/00;C22C12/00;C22C30/00;H01B1/02;H01L27/24 主分类号 H01L45/00
代理机构 代理人
主权项 1. A phase change material, comprising GaxSbyGez, wherein x, y and z are atomic percentages, with a Ga atomic concentration x within a range from 20% to 45%, a Sb atomic concentration y within a range from 25% to 40% and a Ge atomic concentration z within a range from 25% to 55%.
地址 HSINCHU TW