发明名称 SEMICONDUCTOR INTERTIA SENSOR AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To obtain a semiconductor intertia sensor, which is suited to mass- production because of low cost through the elimination of laser processing and is low in parastic capacity, highly sensitive and accurate for forming gap between electrodes. SOLUTION: A semiconductor intertia sensor 30 is provided with a movable electrode 26 on the upper side of a glass substrate 10, and a pair of fixed electrodes 27 and 28 are provided with the movable electrode 26 in between. The movable electrode 26 is formed by laminating a film 21a and a single crystal layer 22a, which can be etched without eroding silicon, and the fixed electrodes 27 and 28 are formed by laminating films 21b and 21c which can be etched without eroding silicon. The glass substrate 10 is bonded with the films 21b and 21c of the fixed electrodes 27 and 28, through a spacer layer 24 made of single-crystal silicon.
申请公布号 JPH10178185(A) 申请公布日期 1998.06.30
申请号 JP19960337116 申请日期 1996.12.17
申请人 MITSUBISHI MATERIALS CORP 发明人 SHIBATANI HIROSHI;MURAISHI KENSUKE
分类号 G01P15/125;B81B3/00;B81C1/00;G01C19/56;H01L29/84 主分类号 G01P15/125
代理机构 代理人
主权项
地址