发明名称 REFLECTOR PLATE AND EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a reflector plate having a random ruggedness distribution. SOLUTION: The reflector plate 1 is provided with a substrate 2, on which ruggedness having the displacement distribution of a depth direction corresponding to the intensity distribution of speckles to be generated at the time of irradiating a scatterplate with a coherent light or a quasi-coherent light and a reflection film 3 formed on the substrate 2. The reflector plate 1 has ruggedness corresponding to random speckle patterns to be generated by a stochastic process on its reflection area and since regularity is precluded from the distribution of the reggedness, the plate 1 can reflect an incident light entering from a prescribed angle so that intensities of reflected lights are smoothly and continuously distributed over the range of prescribed angles around an angle of specular reflection with respect to the incident light without generating diffraction or the like and, especially, the plate 1 is suitable for the reflection electrode of a reflection type liquid crystal display device.
申请公布号 JPH10253977(A) 申请公布日期 1998.09.25
申请号 JP19970059528 申请日期 1997.03.13
申请人 TOSHIBA CORP 发明人 NAKAI YUTAKA
分类号 G02F1/1335;G02F1/1343;G09F9/30 主分类号 G02F1/1335
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