| 摘要 |
PURPOSE:To obtain high resolution with respect to a pattern on a body to be processed when a chemical amplification type resist material is used. CONSTITUTION:The entire body of a main body 2 of an applying and developing device is covered with a covering body. A neutralization reaction chamber 6, into which acidic gas is supplied, is provided at an air intake port 51. A filter part 81 for removing particles and a sucking means 82 are provided beneath the chamber 6. When external air passes through the neutralization reaction chamber 6, weak acid property is provided by the neutralizing reaction of alkali component such as ammonia and amine in the air and the acidic gas in this constitution. Since acid is generated by exposure in a chemical amplification type resist film and modification occurs, but the modification is not hindered in this constitution. |
