发明名称 PRODUCTION OF METAL OXIDE THIN FILM AND METAL OXIDE THIN FILM
摘要 PROBLEM TO BE SOLVED: To form a metal oxide-based transparent conductive film having low resistance and high transmittance for visible rays at a low temp. in a short time by applying a coating liquid containing a metal alkoxide and/or metal salt, heating, drying and then irradiating with UV rays or visible rays. SOLUTION: A coating liquid containing a metal alkoxide such as In and Sn and metal salt is applied on a transparent substrate such as an org. polymer film. The coating liquid is prepared by using an org. solvent and/or water as a solvent, and if necessary, adding the fine seed crystal of the objective metal oxide, and further a binder hydrolysis catalyst, photosensitizer, coloring agent or the like, and the liquid is prepared to about 1 to 30 wt.% concn. If necessary, a TiO2 thin film is previously formed on the transparent substrate, or TiO2 fine particles are added to the coating liquid. The coating film is preferably heated to 20 to 100 deg.C to completely or incompletely dry. The dried film is irradiated with UV rays or visible rays to form a metal oxide-based thin film.
申请公布号 JPH11106935(A) 申请公布日期 1999.04.20
申请号 JP19970267027 申请日期 1997.09.30
申请人 FUJI PHOTO FILM CO LTD 发明人 ADEGAWA YUTAKA
分类号 C03C17/27;C23C18/14;H01L21/288;H01L31/04;H01L51/50;H01L51/52;H05B33/14;H05B33/28 主分类号 C03C17/27
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