摘要 |
Gas is sucked up by the cleaning nozzle in a direction parallel to the upstream side of the particle capturing device and through this device in the opposite direction to the flow of particle-laden gas, the parallel flow being substantially greater than the through-device flow and forming a flow zone with a high length to height ratio. DETAILED DESCRIPTION - A method for treating a flow of particle-laden gas is carried out in a reactor containing narrow gas passages which are too small for certain size particles to pass through, resulting in them being collected on essentially fixed capturing devices. A suction nozzle (7) can be moved over the particle capturing side of the device to remove accumulated particles. A first partial flow of gas is sucked up essentially parallel to the upstream-facing side of the device, and a second partial flow is sucked through the device in the opposite direction to the flow of particle-laden gas. The first partial flow is (preferably substantially) greater than the second partial flow and passes through a zone whose length in the flow direction is more than half the height distance in a direction perpendicular to the particle capturing device. An INDEPENDENT CLAIM is also included for the reactor used for this method, in which the particle capturing device is perforated plate or screen placed inside a gas channel (1) |