发明名称 POLYIMIDE PRECURSOR-CONTAINING RESIN COMPOSITION, AND POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE USING THE SAME AND PATTERN FORMATION OF THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain a resin composition useful for e.g. dielectric layers adapted for e.g. fine wiring in electronic devices and capable of providing such a resin as to show a good flatness and the transparency to visible ultraviolet light at the same time besides the heat resistance and mechanical strength inherent in the resin by including a specific polyimide precursor. SOLUTION: This resin composition comprises a polyimide precursor [e.g. comprising respectively 5 to 95 mol.% and 95 to 5 mol.% of the following RU1 and RU2] having a repeating unit (RU1) of formula I (R1 is a bivalent organic group; and (n) is a repeating number) or repeating unit (RU2) of formula II (R2 is R1; R3 is a monovalent organic group; and (m) is (n)). A positive type photosensitive resin composition may be obtained by including a photosensitive substance (e.g. an orthoquinone diazide compound) together with the polyimide precursor.
申请公布号 JP2000026722(A) 申请公布日期 2000.01.25
申请号 JP19980196941 申请日期 1998.07.13
申请人 HITACHI LTD;HITACHI CHEM CO LTD 发明人 MAEKAWA YASUNARI;MIWA TAKAO;UENO TAKUMI;OKABE YOSHIAKI
分类号 G03F7/037;C08L79/08;G03F7/039;G03F7/26;G03F7/30 主分类号 G03F7/037
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