发明名称 |
POLYIMIDE PRECURSOR-CONTAINING RESIN COMPOSITION, AND POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE USING THE SAME AND PATTERN FORMATION OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To obtain a resin composition useful for e.g. dielectric layers adapted for e.g. fine wiring in electronic devices and capable of providing such a resin as to show a good flatness and the transparency to visible ultraviolet light at the same time besides the heat resistance and mechanical strength inherent in the resin by including a specific polyimide precursor. SOLUTION: This resin composition comprises a polyimide precursor [e.g. comprising respectively 5 to 95 mol.% and 95 to 5 mol.% of the following RU1 and RU2] having a repeating unit (RU1) of formula I (R1 is a bivalent organic group; and (n) is a repeating number) or repeating unit (RU2) of formula II (R2 is R1; R3 is a monovalent organic group; and (m) is (n)). A positive type photosensitive resin composition may be obtained by including a photosensitive substance (e.g. an orthoquinone diazide compound) together with the polyimide precursor. |
申请公布号 |
JP2000026722(A) |
申请公布日期 |
2000.01.25 |
申请号 |
JP19980196941 |
申请日期 |
1998.07.13 |
申请人 |
HITACHI LTD;HITACHI CHEM CO LTD |
发明人 |
MAEKAWA YASUNARI;MIWA TAKAO;UENO TAKUMI;OKABE YOSHIAKI |
分类号 |
G03F7/037;C08L79/08;G03F7/039;G03F7/26;G03F7/30 |
主分类号 |
G03F7/037 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|