发明名称 HEAT TREATMENT AND PRODUCTION OF FLUORIDE SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To produce a single crystal useful for high-accurcy optical systems, having high transmissivity, low distorted and having no turbidness in its inner portion by removing adsorbate or accretion on the surface of a fluoride single crystal to clean the surface and then by heat-treating the single crystal through retaining it in a heated state and gradually cooling it. SOLUTION: The method of this invention is to purify the surface of a fluoride single crystal before heat treatment, in consideration of the fact that the cause of turbidness in its inner portion of a fluoride single crystal due to heat treatment is based on impurities, stain, moisture or oxygen-containing ingredients respectively attached or adsorbed on the surface of a treating object. And the above method is to conduct heat treatment by retaining the fluoride single crystal in a heated state and gradually cooling it, followed by removing an alteration layer formed on its surface due to the heat treatment because even a fluoride single crystal the surface of which is cleaned before heat treatment is etched on its surface due to the existence of heat or a fluorinating agent during the heat treatment, which leads to the formation of alteration layer causing the quality degradation of the fluoride single crystal.
申请公布号 JP2000034193(A) 申请公布日期 2000.02.02
申请号 JP19980202072 申请日期 1998.07.16
申请人 NIKON CORP;OYO KOKEN KOGYO KK 发明人 MIZUGAKI TSUTOMU;TAKANO SHUICHI
分类号 G02B1/02;C30B29/12;C30B33/00;C30B33/02;H01S5/00 主分类号 G02B1/02
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