| 摘要 |
<p>A plasma-resistant member for use in a reaction chamber of an apparatus for plasma treatment, which is made from alumina sintered compact having a mean crystal grain diameter of 18 to 45 νm, a surface roughness in terms of Ra of 0.8 to 3.0 νm and a bulk density of 3.90 g/cm3 or more.</p> |
