| 摘要 |
PROBLEM TO BE SOLVED: To obtain desired high sensitivity by using a substance as a sensitizing substance which accumulates electrons or energy by irradiation of electron beams and emits the electrons or energy again into the resist coating film. SOLUTION: The electron beam negative resist compsn. contains an alkali soluble resin, acid crosslinking substance, acid generating agent and sensitizing substance. The sensitizing substance accumulates electrons or energy by irradiation of electron beams and emits the electrons or energy again to the resist film. In this case, it is supposed that the high sensitivity of the resist is obtd. by increase in the acid generating efficiency of the acid generating agent by electrons or energy emitted again from the sensitizing substance and by acceleration of crosslinking. As for the sensitizing substance, any substance can be used as far as it is soluble with a solvent used for the preparation of the resist compsn. and is soluble with an alkali aq. soln. used for a developer. |
