| 摘要 |
<p>A photoresist coater (10) has a rotatable chuck (22) to support a substrate (20), a source of photoresist, a pivotable dispensing arm (42) extendable over the chuck, and a nozzle (68) at the end of the dispensing arm. The nozzle has an aperture with a dimension sufficiently small that photoresist directed therethrough forms an aerosol which is directed onto the substrate.</p> |
