An improved process for producing dielectric substrates with multilayer antireflector coatings and a dielectric substrate with multilayer antireflector coatings thereon,申请号IN1994MA90519-传众专利搜索

发明名称	An improved process for producing dielectric substrates with multilayer antireflector coatings and a dielectric substrate with multilayer antireflector coatings thereon
摘要
申请公布号	IN184129(B)	申请公布日期	2000.06.17
申请号	IN1994MA90519	申请日期	1994.09.15
申请人	INDIAN SPACE RESEARCH ORGANISATION, DEPARTMENT OF SPACE	发明人	SHANBHOGUE HANDATTU GANESH;ANNAPURNA MULUKUNTE NARASIMHAIAH;KUMAR SANKARAN NAIR AJITH;NAGENDRA CHANNAMALLAPPA LINGARAJU;MURTHY THUTUPALLI GOPALAKRISHNA
分类号	C03C17/34;(IPC1-7):C03C17/34	主分类号	C03C17/34
代理机构		代理人
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