发明名称 METHOD AND DEVICE FOR DRYING SUBSTRATE
摘要 <p>A device for drying substrates which stores a plurality of substrates (1) and which comprises a processing container (3) to which cleaning fluid (2) after cleaning the substrates (1) is drained and an injection nozzle (5) for injecting drying fluid located at the terminating part of a feed pipe (4) through which liquid drying fluid is supplied, whereby an exhaust equipment is eliminated or simplified, and the drying fluid is fed smoothly.</p>
申请公布号 WO2000042373(P1) 申请公布日期 2000.07.20
申请号 JP1999004335 申请日期 1999.08.10
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