发明名称 NEGATIVE RESIST COMPOSITION
摘要 PROBLEM TO BE SOLVED: To prevent swelling and to form a perpendicular cross-sectional shape as well as to ensure high transparency to ArF excimer laser light and high resolution by using a resin which has functional groups capable of forming an ester by reaction with each other, forms the ester by dehydration under an acid and becomes alkali-insoluble. SOLUTION: This negative resist composition contains a compound which generates an acid when irradiated and a resin which has two functional groups capable of forming an ester by reaction with each other, forms the ester by dehydration by the action of the generated acid and becomes alkali-insoluble. The resin, e.g. has hydroxyalkyl, carboxyl or carboxylic ester groups in a side chain of the principal skeleton and is a polymer of a monomer selected from α-(hydroxyalkyl)acrylic acids and alkyl α-(hydroxyalkyl)acrylates.
申请公布号 JP2000206694(A) 申请公布日期 2000.07.28
申请号 JP19990037847 申请日期 1999.02.16
申请人 TOKYO OHKA KOGYO CO LTD 发明人 HANEDA HIDEO;IWAI TAKESHI;FUJIMURA SATOSHI
分类号 H01L21/027;G03F7/004;G03F7/033;G03F7/038;G03F7/039 主分类号 H01L21/027
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