PHOTOSENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To obtain a photosensitive polyimide precursor composition having high sensitivity and being developable at high resolution with an aqueous alkali solution. SOLUTION: The photosensitive resin composition contains (a) a polyamide acid ester having structural units of the formulae (where each of X1-X3 is a tetravalent organic group, each of Y1-Y3 is a divalent organic group and each of R1 and R2 is photosensitive group having secondary carbon as a bonding site), (b) a compound containing a carbon-carbon double bond which can be polymerized under actinic radiation and (c) a photopolymerization initiator.