发明名称 COPPER PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To increase a service life of a plating solution, and to reduce the manufacturing cost by adsorbing an additive for a copper plating solution, in particular, a brightener in an article to be plated in advance, and achieving the electroplating in a copper plating bath containing no brightener. SOLUTION: A brightener to be adsorbed in an article to be plated in advance includes bis (3-sulfopropyl) di-sulfide or its 2-sodium salt. Its concentration is 0.001-10 g/l. A polymer component and a leveler component can be added to the brightener. The polymer includes polyvinyl alcohol, and its concentration is preferably 0.01-100 g/l. The leveler includes acetamide, and its concentration is preferably 0.001-10 g/l. Regarding the operational condition, the liquid temperature in a plating bath is preferably 10-60 deg.C, and the current density is preferably 0.1-10 A/dm2.
申请公布号 JP2000219994(A) 申请公布日期 2000.08.08
申请号 JP19990019795 申请日期 1999.01.28
申请人 ELECTROPLATING ENG OF JAPAN CO 发明人 SONE TAKAYUKI;WACHI HIROSHI
分类号 H05K3/18;C25D3/38;C25D5/34;C25D7/00;C25D7/12;H01L21/288;H01L21/768;H05K3/42;H05K3/46;(IPC1-7):C25D3/38 主分类号 H05K3/18
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