| 摘要 |
PURPOSE: A crosslinking monomer, the polymer of the crosslinking monomer and the photoresist composition using the same are provided. it is useful to the photoresist for ArF or EUV required photo responsiveness for the high density of the crosslinking agent because the crosslinking agent is chemical emplified and consists as polymer. CONSTITUTION: A crosslinking monomer is represented by the following formula 1, wherein, X is O, S or C, n is 1-2, p is 0-5 and R1 and R2 is independently alkyl, ester, ketone, carboxylic acid and acetal which are substituted main chain or side chain of carbon number of 1-10, alkyl, ester, ketone, carboxylic acid and acetal which are substituted main chain or side chain of carbon number of 1-10 containing one more of hydroxy group(-OH), R3 and R4 is independently hydrogen or methyl. The photoresist composition comprises: (i) photoresist resin; (ii) a crosslinking agent composed crosslinking monomer of the formula 1 or the polymer of the same; (iii) a photoacid generator; and (iv) an organic solvent.
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