| 摘要 |
<p>PROBLEM TO BE SOLVED: To continuously and uniformly form a mixed film composed of different element and having prescribed compositional ratios and objective thickness on the surface of a film in the process of running. SOLUTION: This device is provided with a crucible 9 capable of holding a vapor depositing material 16 of different kinds, an electron gun 4 heating and vapor- depositing the vapor depositing material 16, an X-ray irradiating means 7a of irradiating a vapor deposition mixed film with 1st X-rays, characteristics X-ray measuring means 7b and 7c measuring the intensity of characteristic (fluorescent) X-rays excited by the 1st X-rays, a standard board moving means 7d of moving a standard board 7e provided with plural standard samples having the already-known characteristics to the irradiating optical path of the 1st X-rays so as to be capable of entering it and withdrawing therefrom, a correcting means 14 of correcting the characteristic X-ray intensity measured by the characteristic X-ray measuring means 7d and 7c based on the measured value of the characteristic X-ray intensity obtd. from the standard sample, a controlling quantity computing element 15 outputting the thickness by components of the mixed film based on the characteristic X-ray intensity and a thickness controlling means 20 of controlling the electron gun 4 based on the thickness data obtd. by the controlling quantity computing element 15 or data corrected by the correcting device 14.</p> |
