EXPOSURE DEVICE FOR CHARGED PARTICLE BEAM, AND RETICLE

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam exposure device and a reticle in which circuit marks near alignment marks are not deformed. SOLUTION: This reticle has a pattern region to be exposed to charged particle beams in a region including scribe lines of wafers. The pattern region has a circuit subfield where circuit patterns 16 are formed and an alignment subfield 17 where alignment patterns are to be formed, and the alignment subfield is formed in the position adjacent to the circuit subfield.