| 摘要 |
PROBLEM TO BE SOLVED: To provide a new substrate processing apparatus which is more energy-saving and space-saving than the conventional apparatus and is capable of controlling its temperature and humidity. SOLUTION: An application development device 1 is equipped with a resist applicator 30 with a cup CP, and an air feeder 81 feeds air of prescribed temperature and humidity into the cup CP, where the air feeder 81 is equipped with a cooling dehumidifying section 86, a bypass circuit 87, a heating section 88, humidifying section 89, and a blower 90, 55% of introduced air is cooled down and dehumidified in the cooling/dehumidifying section 86, 45% of the introduced air is made to pass through the bypass circuit 89, a mixed air of cooled and dehumidified air and air that passes through the bypass circuit 87 is heated in the heating section 88 and humidified in the humidifying section 89. |
