发明名称 GAS TREATMENT METHOD
摘要 <p>PROBLEM TO BE SOLVED: To obtain an excellent gas treatment method capable of removing a target gas component from a gas (exhaust gas) containing an org. gas such as org. solvent gas efficiently, inexpensively and simply by decomposition or the like. SOLUTION: The gas-liquid contact of a gas to be treated containing an org. gas component with a gas treatgment liquid is performed in a gas treatment tower and a part of the gas obtained after the gas-liquid contact in the gas treatment tower is again brought into contact with the gas treatment liquid in the gas treatment tower and the org. gas component dissolved in the gas treatment liquid is decomposed or removed by pref. using a microbiological treatment method to extremely efficiently treat objective gas to be treated.</p>
申请公布号 JP2000300937(A) 申请公布日期 2000.10.31
申请号 JP19990108517 申请日期 1999.04.15
申请人 FUJI PHOTO FILM CO LTD 发明人 NARUSE YASUTO
分类号 B01D53/34;B01D53/44;B01D53/77;(IPC1-7):B01D53/34 主分类号 B01D53/34
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