| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an X-ray topography device capable of making an X-ray topography measurement of a sample under a special condition. SOLUTION: A sample S is irradiated with an X-ray from an x-ray source F being regulated by incident side slits 22a, 22b so that the X-ray diffracted by the sample S is detected by an X-ray film 7a or a CCD sensor 7b. An X-ray incident angleωis adjusted relative to the sample S by rotating anωmovable carriage 11 about anωaxis Xωin the directions of arrows C-C', and a slit 9 and theωmovable carriage 11 are translationally moved by translationally moving a base 2 in the directions of arrows A-A', so that a diffracted X-ray image corresponding to the whole surface of the sample S is detected by the x-ray film 7a or the CCD sensor 7b. Since the sample S is held static during measurement, a special condition can be ensured by attaching accessory equipment, such as a sample formation growth furnace 8, to the sample S.</p> |
