发明名称 Method for forming integrated circuits on a strained semiconductor substrate
摘要 An electronic circuit on a strained semiconductor substrate, includes: electronic components on a first surface of a semiconductor substrate; and at least portions of a layer of a porous semiconductor material on the side of a second surface of the semiconductor substrate, opposite to the first surface, to bend the semiconductor substrate.
申请公布号 US9525067(B2) 申请公布日期 2016.12.20
申请号 US201414533770 申请日期 2014.11.05
申请人 STMicroelectronics (Crolles 2) SAS 发明人 Bensahel Daniel-Camille;Halimaoui Aomar
分类号 H01L21/70;H01L29/78;H01L29/06;H01L29/32;H01L21/18;H01L21/3063 主分类号 H01L21/70
代理机构 Seed IP Law Group LLP 代理人 Seed IP Law Group LLP
主权项 1. A strained integrated device structure comprising: integrated devices formed at a first surface of a semiconductor substrate; a semiconductor support including a first surface, a second surface, porous semiconductor material formed at the first surface of the semiconductor support, and a region of nonporous semiconductor material positioned within the semiconductor support and between the porous semiconductor material and a bottom of the integrated devices, wherein the semiconductor support is bonded to a second surface of the semiconductor substrate and the semiconductor substrate includes a region of strained semiconductor located between the porous semiconductor material and the integrated devices, wherein the porous semiconductor material is formed as a plurality of islands separated by regions of non-porous semiconductor material.
地址 Crolles FR