发明名称 |
Method for forming integrated circuits on a strained semiconductor substrate |
摘要 |
An electronic circuit on a strained semiconductor substrate, includes: electronic components on a first surface of a semiconductor substrate; and at least portions of a layer of a porous semiconductor material on the side of a second surface of the semiconductor substrate, opposite to the first surface, to bend the semiconductor substrate. |
申请公布号 |
US9525067(B2) |
申请公布日期 |
2016.12.20 |
申请号 |
US201414533770 |
申请日期 |
2014.11.05 |
申请人 |
STMicroelectronics (Crolles 2) SAS |
发明人 |
Bensahel Daniel-Camille;Halimaoui Aomar |
分类号 |
H01L21/70;H01L29/78;H01L29/06;H01L29/32;H01L21/18;H01L21/3063 |
主分类号 |
H01L21/70 |
代理机构 |
Seed IP Law Group LLP |
代理人 |
Seed IP Law Group LLP |
主权项 |
1. A strained integrated device structure comprising:
integrated devices formed at a first surface of a semiconductor substrate; a semiconductor support including a first surface, a second surface, porous semiconductor material formed at the first surface of the semiconductor support, and a region of nonporous semiconductor material positioned within the semiconductor support and between the porous semiconductor material and a bottom of the integrated devices, wherein the semiconductor support is bonded to a second surface of the semiconductor substrate and the semiconductor substrate includes a region of strained semiconductor located between the porous semiconductor material and the integrated devices, wherein the porous semiconductor material is formed as a plurality of islands separated by regions of non-porous semiconductor material. |
地址 |
Crolles FR |