发明名称 |
ABRASIVE MATERIAL COMPOSITION FOR GLASS POLISHING AND POLISHING METHOD USING THE SAME |
摘要 |
<p>PROBLEM TO BE SOLVED: To obtain the subject composition capable of forming a highly accurate polished surface and useful for polishing glass substrates for magnetic disks by including titanium oxide minute particles as abrasive material. SOLUTION: This composition is obtained by including as abrasive material titanium oxide minute particles containing secondary particles having a mean size of preferably 0.1-1.0μm and preferably in addition, at least one kind of magnesium compound (preferably such as magnesium nitrate, magnesium sulfate or magnesium chloride). The composition is preferably in the form of a slurry made by dispersing the above particles in a dispersion medium. The amount of the above titanium oxide particles to be added is preferably 5-30 wt.% as solid concentration in slurry. The composition makes it possible to polish a glass substrate for magnetic disks into a highly accurate mirror finished surface making it suitable for a magnetic head to make a travel at low levitation.</p> |
申请公布号 |
JP2000345143(A) |
申请公布日期 |
2000.12.12 |
申请号 |
JP19990156952 |
申请日期 |
1999.06.03 |
申请人 |
SHOWA DENKO KK |
发明人 |
MASUDA TOMOYUKI;SAEGUSA HIROSHI;YAMAGUCHI YOSHIE;OBARA NOBUHIKO |
分类号 |
B24B37/00;C09K3/14;(IPC1-7):C09K3/14 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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