| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive substrate which is adjusted so as to obtain a product having uniform quality even if an unevenness is caused in the intrasurface reflectance of a substrate when a fine pattern is formed using the photosensitive substrate obtained by disposing a photoresist layer on the substrate by way of an organic antireflection layer. SOLUTION: When a solution containing a highly light absorbing compound and a nitrogen-containing crosslinkable compound in an organic solvent is applied on a substrate and dried to dispose an organic antireflection layer and a photoresist layer is laminated on the antireflection layer and subjected to image forming exposure and development to form a fine pattern, the refractive index and absorbency coefficient of the organic antireflection layer are adjusted to 1.7-2.1 and >0.6 to 1.0, respectively, by selecting the kind and content of the highly light absorbing compound in the solution. |
