MULTILAYER STRUCTURE AND PROCESS FOR PRODUCING THE SAME

摘要

A conductive sinter obtained from a mixture of titanium oxide particles and 2.5% by weight niobium oxide particles is used as a target in direct current sputtering to form a photocatalytically active film mainly comprising titanium oxide on a glass substrate. The target has a surface resistance of 500 .OMEGA./~ or lower and the sputtering is conducted while heating the substrate at 230.degree.C. The photocatalytically active film is based on an amorphous matrix. This process is free from problems of a conventional process in which a photocatalytically active titanium oxide film is deposited by reactive sputtering using titanium metal as a target. The problems are that the substrate needs to be heated to 350.degree.C or higher and that the deposited film does not have high photocatalytic activity.